On November 5 and 6, 2018, the ID5, a forum of five world’s major Industrial Design offices consisting of the Japan Patent Office (JPO), the United States Patent and Trademark Office (USPTO), the European Union Intellectual Property Office (EUIPO), the China National Intellectual Property Administration (CNIPA), and the Korean Intellectual Property Office (KIPO), held its fourth Annual Meeting in Seoul, Republic of Korea. Director-General Sawai of the Patent and Design Examination Department headed the JPO delegation for the meeting. At the meeting, the “ID5 Joint Statement” was adopted. It is an agreed statement declaring that the ID5 will jointly aim to consolidate protection of new technological designs against the backdrop of advancement of the fourth industrial revolution. Moreover, the ID5 decided that the ID5 will embark on new efforts to contribute to international coordination of the design protection systems and improvement of user-friendliness.

Source: JPO